Extreme Ultraviolet Lithography Market 2021 Growth Analysis, Increasing Demand and Strategic Outlook – 2030 | ASML, Nikon, Canon, Intel Corporation, Samsung Electronics Co. Ltd

Global Extreme Ultraviolet Lithography Market Size, Status And Forecast 2021-2030

MarketInsightsReports, one of the world’s prominent market research firms has released a new report on Extreme Ultraviolet Lithography Market. The report contains crucial insights on the market which will support the clients to make the right business decisions.

The global extreme ultraviolet lithography market is expected to grow from $2.33 billion in 2020 to $2.87 billion in 2021 at a compound annual growth rate (CAGR) of 23.33%. The growth is mainly due to the companies resuming their operations and adapting to the new normal while recovering from the COVID-19 impact, which had earlier led to restrictive containment measures involving social distancing, remote working, and the closure of commercial activities that resulted in operational challenges. The market is expected to reach $5.7 billion in 2025 at a CAGR of 18.72%.

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The research report is a compilation of key data with regards to the competitive landscape of this vertical and the multiple regions where the business has successfully established its position.

Top Companies in the Global Extreme Ultraviolet Lithography Market: ASML, Nikon, Canon, Intel Corporation, Samsung Electronics Co. Ltd., Taiwan Semiconductor Manufacturing Company Limited (TSMC), SUSS Microtec AG, Carl Zeiss AG, Toshiba, and Ultratech Inc.

The extreme ultraviolet lithography market consists of sales of extreme ultraviolet lithography (EVUL) systems by entities (organizations, sole traders, and partnerships) that are engaged in manufacturing extreme ultraviolet lithography systems that use the smallest wavelength to create circuits with small features and obtain an output with better resolution. Only goods and services traded between entities or sold to end consumers are included.

The extreme ultraviolet lithography market covered in this report is segmented by equipment into light source, mirrors, mask, others; by light source into laser-produced plasma, gas discharge, vacuum sparks; by end-user into integrated device manufacturers (IDM), foundry, others.

The regions covered in this report are Asia-Pacific, Western Europe, Eastern Europe, North America, South America, Middle East and Africa.

The high price of extreme ultraviolet lithography systems may restrict the growth of the extreme ultraviolet lithography market. Lithography machine is one of the major tools in manufacturing chips. High-end lithography machines for cutting the most sophisticated chips are produced by only one company, ASML. The extreme ultraviolet lithography machine is made of more than 1,00,000 parts and costs about $120 million. Therefore, the high price of the systems may restrict the growth of the extreme ultraviolet lithography market.

Increasing demand for smartphones is expected to boost the demand for the extreme ultraviolet lithography market. Extreme ultraviolet lithography (EUVL) is an advanced technology used for manufacturing more powerful microprocessors than traditional ones for smartphones and personal computers. EUV lithography helps build compact electronics chips with less complexity, reduced cost, and fewer power requirements. According to the joint study conducted by ASSOCHAM-PwC in May 2019, the number of smartphone users in India is expected to double to reach 859 million by 2022. Thus, increasing demand for more advanced smartphones creates a higher demand for EUV lithography to enable chipmakers to produce faster, smaller, and more powerful chips.

Companies operating in the market are continuously focusing on introducing new technologies to attract a large consumer base. For instance, Taiwan Semiconductor Manufacturing Company Limited (TSMC) introduced seven-nanometer plus (N7+), the first commercially available extreme ultraviolet (EUV) lithography technology in the industry, delivering consumer products to market in large volume. The N7+ method with EUV technology is built on TSMC�s successful 7nm node and covers the way for 6nm and high-level technologies. N7+ contributes 15% to 20% more density and increased power consumption than the N7 process, making it an increasingly popular choice for the industry�s next-wave outcomes.

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Influence of the Extreme Ultraviolet Lithography market report:

-Comprehensive assessment of all opportunities and risk in the Extreme Ultraviolet Lithography market.

-Extreme Ultraviolet Lithography market recent innovations and major events.

-Detailed study of business strategies for growth of the Extreme Ultraviolet Lithography market-leading players.

-Conclusive study about the growth plot of Extreme Ultraviolet Lithography market for forthcoming years.

-In-depth understanding of Extreme Ultraviolet Lithography market-particular drivers, constraints and major micro markets.

-Favourable impression inside vital technological and market latest trends striking the Extreme Ultraviolet Lithography market.

Browse the report description and TOC: https://www.marketinsightsreports.com/reports/03242748170/extreme-ultraviolet-lithography-global-market-report-2021-covid-19-growth-and-change-including-1-by-equipment-light-source-mirrors-mask-others-2-by-light-source-laser-produced-plasma-gas-discharge-vacuum-sparks-3-by-end-user-integrated-device-manufacturers-idm-foundry-others-covering-asml-nikon-canon-intel-corporation-samsung-electronics-co-ltd?mode=xix

What are the market factors that are explained in the report?

-Key Strategic Developments: The study also includes the key strategic developments of the market, comprising R&D, new product launch, M&A, agreements, collaborations, partnerships, joint ventures, and regional growth of the leading competitors operating in the market on a global and regional scale.

-Key Market Features: The report evaluates key market features, including revenue, price, capacity, capacity utilization rate, gross, production, production rate, consumption, import/export, supply/demand, cost, market share, CAGR, and gross margin. In addition, the study offers a comprehensive study of the key market dynamics and their latest trends, along with pertinent market segments and sub-segments.

-Analytical Tools: The Global Extreme Ultraviolet Lithography Market report includes the accurately studied and assessed data of the key industry players and their scope in the market by means of a number of analytical tools. The analytical tools such as Porter’s five forces analysis, SWOT analysis, feasibility study, and investment return analysis have been used to analyze the growth of the key players operating in the market.

Customization of the Report: This report can be customized as per your needs for additional data up to 3 companies or countries or 40 analyst hours.

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How we have factored the effect of Covid-19 in our report:

All the reports that we list have been tracking the impact of COVID-19. Both upstream and downstream of the entire supply chain has been accounted for while doing this. Also, where possible, we will provide an additional COVID-19 update supplement/report to the report in Q3, please check for with the sales team.

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